Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition

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Principal investigation.pdf (2.68 MB)

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Authors

Shang, Hongpeng

URI

https://doi.org/10.20381/ruor-23175
http://hdl.handle.net/10393/38925

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Publications en libre accès financées par uOttawa // uOttawa-Financed Open Access Publications

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