Skip to main content
English
Français
Log In
uoAccess ID
RuOR ID
Username
Password
Log in
(for affiliates)
Contact us for help
Communities & Collections
Browse
Statistics
About
About uO Research
Policies
FAQ
Home
Libre accès // Open Scholarship
Publications en libre accès financées par uOttawa // uOttawa-Financed Open Access Publications
Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition
Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition
Loading...
Files
investigation.pdf
(2.68 MB)
Date
2018
Authors
Sun, DeGui
Sun, Qingyu
Xing, Wenchao
Sun, Zheyu
Shang, Hongpeng
Chang, Liyuan
Wang, Xueping
Liu, Peng
Hall, Trevor
Journal Title
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
URI
https://doi.org/10.20381/ruor-23175
http://hdl.handle.net/10393/38925
Collections
Publications en libre accès financées par uOttawa // uOttawa-Financed Open Access Publications
Related Materials
Alternate Version
Full item page
Statistics
