An ultrahigh vacuum system for the scattering of keV ions by a clean silicon(100) surface.

dc.contributor.advisor	Hird, B.,
dc.contributor.author	Bruyère, Michel Jean.
dc.date.accessioned	2009-03-20T20:27:21Z
dc.date.available	2009-03-20T20:27:21Z
dc.date.created	1990
dc.date.issued	1990
dc.degree.level	Masters
dc.degree.name	M.Sc.
dc.description.abstract	An ultrahigh vacuum surface physics system was designed and built to study ion-surface interactions at various incident angles by detection of the forward scattered particles. The proposed initial measurement is the scattering of keV ions by a clean Si(100) surface.
dc.format.extent	68 p.
dc.identifier.citation	Source: Masters Abstracts International, Volume: 30-03, page: 0774.
dc.identifier.isbn	9780315600249
dc.identifier.uri	http://hdl.handle.net/10393/5952
dc.identifier.uri	http://dx.doi.org/10.20381/ruor-11014
dc.publisher	University of Ottawa (Canada)
dc.subject.classification	Physics, Condensed Matter.
dc.title	An ultrahigh vacuum system for the scattering of keV ions by a clean silicon(100) surface.
dc.type	Thesis

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