Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition

Sun, DeGuiSun, QingyuXing, WenchaoSun, ZheyuShang, HongpengChang, LiyuanWang, XuepingLiu, PengHall, Trevor2019-03-252019-03-2520182158-3226https://doi.org/10.20381/ruor-23175http://hdl.handle.net/10393/38925enInvestigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor depositionArticle10.1063/1.5045516